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Solvent‐Free Phase Separation of Polystyrene‐block‐poly(2‐hydroxyethyl methacrylate) Forming Freestanding Photonic Films

Abstract A solvent‐free approach to the formation of freestanding photonic material from amphiphilic polystyrene‐block‐poly(2‐hydroxyethyl methacrylate) (PS‐b‐PHEMA) is reported, where the application of shear force and pressure induces phase separation. This work demonstrates access to high molecul...

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Autori principali: Martina Plank, Enis Musa Saritas, Bart‐Jan Niebuur, Tobias Meckel, Dirk Lellinger, Peter Krolla, Markus Biesalski, Tobias Kraus, Markus Gallei
Natura: Artigo
Lingua:Inglês
Pubblicazione: Wiley-VCH 2026-01-01
Serie:Advanced Materials Interfaces
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Accesso online:https://doi.org/10.1002/admi.202500593
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