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Formation of Multiscale Pattern Structures by Combined Patterning of Nanotransfer Printing and Laser Micromachining

Various lithography techniques have been widely used for the fabrication of next-generation device applications. Micro/nanoscale pattern structures formed by lithographic methods significantly improve the performance capabilities of the devices. Here, we introduce a novel method that combines the pa...

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Autors principals: Tae Wan Park, Young Lim Kang, Eun Bin Kang, Seungmin Kim, Yu Na Kim, Woon Ik Park
Format: Artigo
Idioma:Inglês
Publicat: MDPI AG 2023-08-01
Col·lecció:Nanomaterials
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Accés en línia:https://www.mdpi.com/2079-4991/13/16/2327
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