Synthesis of TiO<sub>2</sub>/Al<sub>2</sub>O<sub>3</sub> Double-Layer Inverse Opal by Thermal and Plasma-Assisted Atomic Layer Deposition for Photocatalytic Applications
In comparison to conventional nano-infiltration approaches, the atomic layer deposition (ALD) technology exhibits greater potential in the fabrication of inverse opals (IOs) for photocatalysts. In this study, TiO<sub>2</sub> IO and ultra-thin films of Al<sub>2</sub>O<sub>3</sub> on IO were successfu...
Збережено в:
| Автори: | , , , , , , , |
|---|---|
| Формат: | Artigo |
| Мова: | Inglês |
| Опубліковано: |
MDPI AG
2023-04-01
|
| Серія: | Nanomaterials |
| Предмети: | |
| Онлайн доступ: | https://www.mdpi.com/2079-4991/13/8/1314 |
| Теги: |
Немає тегів, Будьте першим, хто поставить тег для цього запису!
|