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Spectroscopic Ellipsometry Analysis of Rapid Thermal Annealing Effect on MBE Grown GaAs1−x−Nx

We report on the effect of rapid thermal annealing (RTA) on GaAs1−x−Nx layers, grown by molecular beam epitaxy (MBE), using room temperature spectroscopic ellipsometry (SE). A comparative study was carried out on a set of GaAs1−x−Nx as-grown and the RTA samples with small nitrogen content (x = 0.1%...

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Bibliografski detalji
Glavni autori: Nebiha Ben Sedrine, Jaouher Rihani, Jean-Christophe Harmand, Radhouane Chtourou
Format: Artigo
Jezik:Inglês
Izdano: National Institute of Telecommunications 2023-06-01
Serija:Journal of Telecommunications and Information Technology
Teme:
Online pristup:https://jtit.pl/jtit/article/view/914
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