Simple Technique to Improve Essentially the Performance of One-Stage Op-Amps in Deep Submicrometer CMOS Technologies
A comparative study of one-stage-amp performance improvement based on simulations in 22 nm, 45 nm, 90 nm, and 180 nm in deep submicrometer CMOS technologies is discussed. Generic SPICE models were used to simulate the circuits. It is shown that in all cases a simple modification using resistive loca...
שמור ב:
| Principais autores: | , , , , |
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| פורמט: | Artigo |
| שפה: | Inglês |
| יצא לאור: |
MDPI AG
2023-01-01
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| סדרה: | Journal of Low Power Electronics and Applications |
| נושאים: | |
| גישה מקוונת: | https://www.mdpi.com/2079-9268/13/1/4 |
| תגים: |
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