Effect of Argon-Oxygen Flow Rate Ratio in Magnetron Sputtering on Morphology and Hygroscopic Property of SnO2 Thin Film
Thin films of tin dioxide (SnO2) were deposited by DC magnetron sputtering on quartz substrate at room temperature in different argon-oxygen gas flow rate ratio i.e. Ar:O2 = 100:20 sccm, 90:30 sccm, 80:40 sccm, 70:50 sccm and 60:60 sccm. X-ray diffraction (XRD) patterns show that as-deposited SnO2 t...
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| Autors principals: | , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Elsevier
2016-08-01
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| Col·lecció: | International Journal of Electrochemical Science |
| Matèries: | |
| Accés en línia: | http://www.sciencedirect.com/science/article/pii/S1452398123054317 |
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