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Fast and Automatic Control of a Frequency-Tuned Radiofrequency Plasma Source

A frequency-tuned radiofrequency (rf) plasma source is automatically controlled to minimize the rf power reflection and to maintain the constant net rf power corresponding to the forward power minus the reflected power. The experiment is performed with a power amplifier operational for the frequency...

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Detalles Bibliográficos
Principais autores: Kazunori Takahashi, Kengo Hanaoka, Akira Ando
Formato: Artigo
Idioma:Inglês
Publicado: Frontiers Media S.A. 2020-01-01
Series:Frontiers in Physics
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Acceso en liña:https://www.frontiersin.org/article/10.3389/fphy.2019.00227/full
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