TiN/TiN+Si/TiN多层膜的高温微动磨损行为研究
用直流等离子体增强化学气相沉积(PCVD)方法在T225NG钛合金基体上制备出厚度约为6μm的TiN/TiN+Si/TiN多层膜,重点研究了多层膜及钛合金基材在室温和高温条件下的微动磨损行为,采用激光共焦扫描显微镜测定磨损体积,用扫描电子显微镜观察磨痕微观形貌.结果表明:在室温(25℃)至400℃范围内,微动初期和稳定阶段多层膜的摩擦系数比钛合金基体低,磨损体积也比钛合金基材明显降低;多层膜磨损体积随着温度的升高而增大;多层膜可以显著降低钛合金基材的磨损;多层膜的损伤主要表现为剥层和磨粒磨损形式.
Sábháilte in:
| Príomhchruthaitheoirí: | , , , |
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| Formáid: | Artigo |
| Teanga: | Inglês |
| Foilsithe / Cruthaithe: |
Editorial Department of Journal of Sichuan University (Natural Science Edition)
2008-01-01
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| Sraith: | 四川大学学报. 自然科学版 |
| Ábhair: | |
| Rochtain ar líne: | http://science.scu.edu.cn/thesisDetails?columnId=156456519&Fpath=home&index=0 |
| Clibeanna: |
Níl clibeanna ann, Bí ar an gcéad duine le clib a chur leis an taifead seo!
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