Chemical and Molecular Variations in Commercial Epoxide Photoresists for X-ray Lithography
The quality of high aspect ratio microstructures fabricated by deep X-ray lithography is highly dependent on the photoresist material used and the process parameters applied. Even with photoresists more suitable to this process, it is common to face defects in the final optical components, such as i...
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| Principais autores: | , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI AG
2018-03-01
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| coleção: | Applied Sciences |
| Assuntos: | |
| Acesso em linha: | http://www.mdpi.com/2076-3417/8/4/528 |
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