Zinc Oxide Nanostructures by Oxidation of Zinc Films Deposited on Oxidized Silicon Substrate
In this work, we report the preparation and characterization of nanostructured ZnO film prepared by a novel technique of oxidation of zinc film. Zinc thin films of thicknesses 100, 200 and 500 nm were deposited on oxidized Si wafer by thermal evaporation technique. The as-deposited films were then a...
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| Asıl Yazarlar: | , |
|---|---|
| Materyal Türü: | Artigo |
| Dil: | Inglês |
| Baskı/Yayın Bilgisi: |
Sumy State University
2011-01-01
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| Seri Bilgileri: | Журнал нано- та електронної фізики |
| Konular: | |
| Online Erişim: | http://jnep.sumdu.edu.ua/download/numbers/2011/1,%20Part%202/articles/jnep_2011_V3_N1(Part2)_409-413.pdf |
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