Fenton reaction chemical mechanical polishing liquid composition optimization of polishing GaN wafer
Aiming at the polishing liquid used for polishing GaN wafers by Fenton reaction CMP, a parameter optimization experiment was carried out with the surface quality as the evaluation index, and the optimal ratio of the polishing liquid components was found out. The results show that when the mass fract...
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| Hoofdauteurs: | , , , , |
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| Formaat: | Artigo |
| Taal: | Chinês |
| Gepubliceerd in: |
Zhengzhou Research Institute for Abrasives & Grinding Co., Ltd.
2022-10-01
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| Reeks: | Jin'gangshi yu moliao moju gongcheng |
| Onderwerpen: | |
| Online toegang: | http://www.jgszz.cn/article/doi/10.13394/j.cnki.jgszz.2022.5001 |
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