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Influence of annealing temperature on the photocatalytic efficiency of sol-gel dip-coated ZnO thin films in methyl orange degradation

ZnO thin films on glass substrates and silicon wafers were prepared by the sol-gel dipcoating technique and annealed at temperatures ranging from 300 - 550 °C. X-ray diffraction (XRD) and Raman analysis confirm the hexagonal wurtzite structure of ZnO. Scanning electron microscopy (SEM) examination c...

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Bibliografski detalji
Glavni autori: A.H. Haritha, M.E. Cruz, O. Sisman, A. Duran, D. Galusek, J.J. Velázquez, Y. Castro
Format: Artigo
Jezik:Inglês
Izdano: Elsevier 2025-03-01
Serija:Open Ceramics
Teme:
Online pristup:http://www.sciencedirect.com/science/article/pii/S2666539524001913
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