The role of low-energy electrons in focused electron beam induced deposition: four case studies of representative precursors

Focused electron beam induced deposition (FEBID) is a single-step, direct-write nanofabrication technique capable of writing three-dimensional metal-containing nanoscale structures on surfaces using electron-induced reactions of organometallic precursors. Currently FEBID is, however, limited in reso...

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Autores principales:	Rachel M. Thorman, Ragesh Kumar T. P., D. Howard Fairbrother, Oddur Ingólfsson
Formato:	Artigo
Lenguaje:	Inglês
Publicado:	Beilstein-Institut 2015-09-01
Colección:	Beilstein Journal of Nanotechnology
Materias:	dipolar dissociation dissociative electron attachment dissociative ionization focused electron beam induced deposition (FEBID) low-energy electron-induced fragmentation neutral dissociation
Acceso en línea:	https://doi.org/10.3762/bjnano.6.194
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