Argon irradiation effects on the structural and optical properties of reactively sputtered CrN films
The present study deals with CrN films irradiated at room temperature (RT) with 200 keV Ar+ ions. The CrN layers were deposited by d.c. reactive sputtering on Si (100) wafers, at nitrogen partial pressure of 5×10-4 mbar, to a total thickness of 280 nm. The substrates were held at 150ºC duri...
Spremljeno u:
| Glavni autori: | , , |
|---|---|
| Format: | Artigo |
| Jezik: | Inglês |
| Izdano: |
International Institute for the Science of Sintering, Beograd
2015-01-01
|
| Serija: | Science of Sintering |
| Teme: | |
| Online pristup: | http://www.doiserbia.nb.rs/img/doi/0350-820X/2015/0350-820X1502187N.pdf |
| Oznake: |
Bez oznaka, Budi prvi tko označuje ovaj zapis!
|