Electrical properties of pure NiO and NiO:Au thin films prepared by using pulsed laser deposition
The electrical properties of pure NiO and NiO:Au Films which are deposited on glass substrate with various dopant concentrations (1wt.%, 2wt%, 3wt.% and 4wt.%) at room temperature 450 Co annealing temperature will be presented. The results of the hall effect showed that all the films were p-type. T...
שמור ב:
| מחבר ראשי: | |
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| פורמט: | Artigo |
| שפה: | Inglês |
| יצא לאור: |
University of Baghdad
2019-02-01
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| סדרה: | Iraqi Journal of Physics |
| נושאים: | |
| גישה מקוונת: | https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/218 |
| תגים: |
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