FEM Studies of CMP Retainer Ring Using Metamodel
This study introduces a novel retainer ring design aimed at mitigating the edge effect during chemical mechanical planarization. The innovative design features an arch-shaped geometry that creates a bending effect, thereby reducing excessive pressure on the wafer's edge. A two-dimensional axisymmetr...
Furkejuvvon:
| Váldodahkkit: | , , , , , , |
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| Materiálatiipa: | Artigo |
| Giella: | Inglês |
| Almmustuhtton: |
Korean Society for Precision Engineering
2025-12-01
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| Ráidu: | 한국정밀공학회지 |
| Fáttát: | |
| Liŋkkat: | http://www.jkspe.or.kr/upload/pdf/JKSPE-025-00007.pdf |
| Fáddágilkorat: |
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