Optimizing Atomic Layer Deposition Processes with Nanowire‐Assisted TEM Analysis
Abstract Atomic layer deposition (ALD) is one of the premier methods to synthesize ultra‐thin materials on complex surfaces. The technique allows for precise control of the thickness down to single atomic layers, while at the same time providing uniform coverage even for structures with extreme aspe...
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| Principais autores: | , , , , |
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| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
Wiley-VCH
2024-05-01
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| Serier: | Advanced Materials Interfaces |
| Fag: | |
| Online adgang: | https://doi.org/10.1002/admi.202301064 |
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