High-Efficiency Grating Coupler in 400 nm and 500 nm PECVD Silicon Nitride With Bottom Reflector
We design and experimentally demonstrate highly efficient Silicon Nitride based grating couplers with bottom distributed Bragg reflectors. All the layers were deposited using plasma enhanced chemical vapor deposition processing. We present gratings on two Silicon Nitride thickness (400 nm and...
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| Autors principals: | , , , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
IEEE
2019-01-01
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| Col·lecció: | IEEE Photonics Journal |
| Matèries: | |
| Accés en línia: | https://ieeexplore.ieee.org/document/8808907/ |
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