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Crystallization of PECVD-deposited Amorphous Silicon Thin Films Using the Aluminum-induced Crystallization Technique
The investigation of polycrystalline silicon made on glass and carbon coated nickel substrates by aluminum-induced crystallization of amorphous silicon (a-Si) is reported. Aluminum was sputtered onto a-Si films deposited in an ultra-high-vacuum plasma-enhanced chemical vapor deposition (PECVD) syste...
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| Autor principal: | |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Springer
2003-01-01
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| Col·lecció: | Journal of King Saud University: Engineering Sciences |
| Accés en línia: | http://www.sciencedirect.com/science/article/pii/S1018363918307736 |
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