Effect of Oxygen Flow Rate on Properties of Aluminum-Doped Indium-Saving Indium Tin Oxide (ITO) Thin Films Sputtered on Preheated Glass Substrates

Amorphous aluminum-doped indium tin oxide (ITO) thin films with a reduced indium oxide content of 50 mass% were manufactured by co-sputtering of ITO and Al₂O₃ targets in a mixed argon–oxygen atmosphere onto glass substrates preheated at 523 K. The oxygen gas flow rate and heat...

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Bibliografische gegevens

Hoofdauteurs:	Svitlana Petrovska, Ruslan Sergiienko, Bogdan Ilkiv, Takashi Nakamura, Makoto Ohtsuka
Formaat:	Artigo
Taal:	Inglês
Gepubliceerd in:	MDPI AG 2021-10-01
Reeks:	Metals
Onderwerpen:	aluminum-doped indium tin oxide amorphous thin film electrical property optical property direct current sputtering radio frequency sputtering
Online toegang:	https://www.mdpi.com/2075-4701/11/10/1604
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