Dataset on large area nano-crystalline graphite film (NCG) grown on SiO2 using plasma-enhanced chemical vapour deposition

A Si wafer coated with a low temperature oxide (LTO) was used as substrate (Si/SiO2) during the deposition of a thick nano-crystalline graphite (NCG) film by means of plasma-enhanced chemical vapour deposition (PECVD) procedure. The process parameters, the atomic force (AFM) and scanning electron (S...

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Podrobná bibliografie

Hlavní autoři:	Camelia Albu, Sandra A.V. Eremia, Monica Lucia Veca, Andrei Avram, Radu Cristian Popa, Cristina Pachiu, Cosmin Romanitan, Mihaela Kusko, Raluca Gavrila, Antonio Radoi
Médium:	Artigo
Jazyk:	Inglês
Vydáno:	Elsevier 2019-06-01
Edice:	Data in Brief
On-line přístup:	http://www.sciencedirect.com/science/article/pii/S2352340919302744
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