At-wavelength metrology of an X-ray mirror using a downstream wavefront modulator
At-wavelength metrology of X-ray optics plays a crucial role in evaluating the performance of optics under actual beamline operating conditions, enabling in situ diagnostics and optimization. Techniques utilizing a wavefront random modulator have gained increasing attention in recent years. However,...
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| Hlavní autoři: | , , |
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| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
International Union of Crystallography
2024-05-01
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| Edice: | Journal of Synchrotron Radiation |
| Témata: | |
| On-line přístup: | http://scripts.iucr.org/cgi-bin/paper?S1600577524002157 |
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