Surrogate sensitivity analysis of facet optical coatings produced without and with in situ design reoptimization
Abstract Optoelectronic and photonic waveguide-based devices often require the control of the exit/entrance facet reflectance to a high degree of precision on a relatively large wavelength range. Fabricating facet optical coatings for that purpose can be challenging due to thickness errors. In this...
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| Format: | Artigo |
| Sprache: | Inglês |
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Nature Portfolio
2025-02-01
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| Schriftenreihe: | Scientific Reports |
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| Online-Zugang: | https://doi.org/10.1038/s41598-025-89625-6 |
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