Rapid thermal annealing for high-quality ITO thin films deposited by radio-frequency magnetron sputtering
In this work, rapid thermal annealing (RTA) was applied to indium tin oxide (ITO) films in ambient atmosphere, resulting in significant improvements of the quality of the ITO films that are commonly used as conductive transparent electrodes for photovoltaic structures. Starting from a single sintere...
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| Principais autores: | , , , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Beilstein-Institut
2019-07-01
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| coleção: | Beilstein Journal of Nanotechnology |
| Assuntos: | |
| Acesso em linha: | https://doi.org/10.3762/bjnano.10.149 |
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