Three-grating monolithic phase-mask for the single-order writing of large-period gratings
An optimized achromatic high-efficiency monolithic phase mask is presented whose principle was demonstrated and described in reference [1]. The mask comprises three submicron period diffraction gratings at a single substrate side that create a purely single spatial frequency interferogram of large p...
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| 主要な著者: | , , , , , , , |
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| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
EDP Sciences
2011-01-01
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| シリーズ: | Journal of the European Optical Society-Rapid Publications |
| 主題: | |
| オンライン･アクセス: | https://jeos.edpsciences.org/articles/jeos/pdf/2011/01/jeos20110611016s.pdf |
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