3D reconstruction and etching profile simulation for wiggling active area effect in dynamic random access memory manufacturing
Abstract Dynamic Random Access Memory (DRAM), a critical component in modern computing systems, relies heavily on the structural integrity of its active area (AA) - a fin-shaped transistor region responsible for charge transfer in memory cells. During advanced DRAM fabrication, the plasma etching pr...
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| Päätekijät: | , , , , , , , , , , , , , , , , |
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| Aineistotyyppi: | Artigo |
| Kieli: | Inglês |
| Julkaistu: |
Nature Portfolio
2026-02-01
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| Sarja: | Communications Engineering |
| Linkit: | https://doi.org/10.1038/s44172-026-00626-3 |
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