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Facile Fabrication of Ultrafine Hollow Silica and Magnetic Hollow Silica Nanoparticles by a Dual-Templating Approach

<p>Abstract</p> <p>The development of synthetic process for hollow silica materials is an issue of considerable topical interest. While a number of chemical routes are available and are extensively used, the diameter of hollow silica often large than 50 nm. Here, we report on a facial route to synth...

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Bibliografiske detaljer
Principais autores: Xiao Xiangheng, Zhang Shaofeng, Peng Tangchao, Ren Feng, Fan Lixia, Wu Wei, Jiang Changzhong
Format: Artigo
Sprog:Inglês
Udgivet: SpringerOpen 2009-01-01
Serier:Nanoscale Research Letters
Fag:
Online adgang:http://dx.doi.org/10.1007/s11671-009-9452-1
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