Wear Resistance of TiAlCrSiN Coatings Deposited by Means of the Co-Sputtering Technique
TiAlCrSiN thin films were deposited on K20 WC–Co substrates using the co-sputtering method. The silicon content in the deposited coatings were varied by modifying the number of silicon pieces (1, 2, or 3) on the Cr target. The morphology, semi-quantitative chemical composition, and microstructure we...
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| Autors principals: | , , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
MDPI AG
2021-06-01
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| Col·lecció: | Lubricants |
| Matèries: | |
| Accés en línia: | https://www.mdpi.com/2075-4442/9/6/64 |
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