The effects of carbon incorporation on the refractive index of PECVD silicon oxide layers

Silicon oxide (SiOx) has many applications, including as a low-refractive index material. Plasma enhanced chemical vapor deposition (PECVD) processes are facile, low temperature routes to produce thin SiOx layers. A route to decrease the refractive index of SiOx films is to increase the layer porosi...

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Bibliografski detalji

Glavni autori:	Benjamin Torda, Lazhar Rachdi, Asmaa Mohamed Okasha Mohamed Okasha, Pierre Saint-Cast, Marc Hofmann
Format:	Artigo
Jezik:	Inglês
Izdano:	AIP Publishing LLC 2020-04-01
Serija:	AIP Advances
Online pristup:	http://dx.doi.org/10.1063/1.5142017
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