Two-step Fabrication of Large Area SiO2/Si Membranes
Two-step fabrication technique of SiO<sub>2</sub>/Si membrane combining the deep local etching of double side polished and thermally oxidized silicon <100> wafer in tetramethylammonium hydroxide (TMAH) water solution and SF<sub>6</sub>/O<sub>2</sub> reactive ion etching is presented in this st...
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| Autors principals: | , , , , , , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Kaunas University of Technology
2012-12-01
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| Col·lecció: | Medžiagotyra |
| Matèries: | |
| Accés en línia: | http://matsc.ktu.lt/index.php/MatSc/article/view/3090 |
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