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Study on Ablation Behaviors and Ablation Rates of a 193nm ArF Excimer Laser System for Selected Substrates in LA-ICP-MS Analysis

Understanding laser ablation behaviors of different target materials is essential for optimum laser parameters, external reference materials selection, as well as for data quality assurance. In this study, ablation behaviors of a 193nm ArF excimer laser for silicate glasses, common minerals, and pow...

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Tallennettuna:
Päätekijät: WU Shi-tou, XU Chun-xue, Klaus Simon, XIAO Yi-lin, WANG Ya-ping
Aineistotyyppi: Artigo
Kieli:Inglês
Julkaistu: Science Press, PR China 2017-09-01
Sarja:Yankuang ceshi
Aiheet:
la-icp-ms
193nm arf excimer laser
ablation behavior
ablation rate
energy density
Linkit:http://www.ykcs.ac.cn/en/article/doi/10.15898/j.cnki.11-2131/td.201703290044
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