Use of silicon or carbonitriding interface in the adhesion of Ag-DLC film on titanium alloy: a comparative study

Abstract A Hollow Cathode Plasma Enhanced Chemical Vapor Deposition (HC-PECVD) reactor was used to deposit silver doped Diamond-Like Carbon (Ag-DLC) films on Ti6Al4V alloy employing two methodologies: i) producing a silicon interlayer, using tetramethylsilane (TMS) as silicon precursor, varying the...

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Váldodahkkit:	Adriano de Oliveira, Argemiro S. da Silva Sobrinho, Douglas M. G. Leite, Jonas J. Neto, Rodolfo L. P. Gonçalves, Marcos Massi
Materiálatiipa:	Artigo
Giella:	Inglês
Almmustuhtton:	Fundação Gorceix 2024-09-01
Ráidu:	REM: International Engineering Journal
Fáttát:	diamond-like carbon PECVD hollow cathode carbonitriding titanium scratch
Liŋkkat:	http://www.scielo.br/scielo.php?script=sci_arttext&pid=S2448-167X2024000401102&lng=en&tlng=en
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