क्यूआर कोड

Comparative Study on Microstructure of Mo/Si Multilayers Deposited on Large Curved Mirror with and without the Shadow Mask

The Mo/Si multilayer mirror has been widely used in EUV astronomy, lithography, microscopy and other fields because of its high reflectivity at the wavelength around 13.5 nm. During the fabrication of Mo/Si multilayers on large, curved mirrors, shadow mask was a common method to precisely control th...

पूर्ण विवरण

में बचाया:
मुख्य लेखकों: Xiangyue Liu, Zhe Zhang, Hongxuan Song, Qiushi Huang, Tonglin Huo, Hongjun Zhou, Runze Qi, Zhong Zhang, Zhanshan Wang
स्वरूप: Artigo
भाषा:Inglês
प्रकाशित: MDPI AG 2023-02-01
श्रृंखला:Micromachines
विषय:
multilayer
shadow mask
curved substrate
magnetron sputtering
ऑनलाइन पहुंच:https://www.mdpi.com/2072-666X/14/3/526
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