Characterization of cosputtered NbTaMoW films
In this study, NbTaMoW medium-entropy alloy films were prepared using a cosputtering apparatus with four sputter guns. Pure-element targets were used for sputtering. The rotational speeds of the substrate holder (RS) were 1–30 rpm. Lower RS values resulted in the formed films exhibiting a multilayer...
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| Autors principals: | , , , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Elsevier
2021-11-01
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| Col·lecció: | Journal of Materials Research and Technology |
| Matèries: | |
| Accés en línia: | http://www.sciencedirect.com/science/article/pii/S2238785421009212 |
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