Combined Feedforward Control and Disturbance Rejection Control Design for a Wafer Stage: A Data-Driven Approach Based on Iterative Parameter Tuning
This article presents a data-driven algorithm that combines the advantages of iterative feedforward tuning and disturbance rejection control to satisfy the precision requirements and ensure extrapolation capability of wafer scanning. The proposed algorithm differs from pre-existing algorithms in ter...
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| Principais autores: | , , |
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| Format: | Artigo |
| Sprog: | Inglês |
| Udgivet: |
IEEE
2020-01-01
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| Serier: | IEEE Access |
| Fag: | |
| Online adgang: | https://ieeexplore.ieee.org/document/9211391/ |
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