Oxidation mechanism of aluminum nitride revisited
Abstract Different from the oxidation kinetics of other nitrides, the oxide layer on AlN can easily reach tens of micrometers at a temperature above 1200 °C. In the present study, the oxidation mechanism of AlN is investigated through microstructure observation. The analysis indicates that the oxide...
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| Hauptverfasser: | , |
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| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Tsinghua University Press
2017-03-01
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| Schriftenreihe: | Journal of Advanced Ceramics |
| Schlagworte: | |
| Online-Zugang: | http://link.springer.com/article/10.1007/s40145-016-0213-1 |
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