Stability of plasma‐enhanced atomic layer deposited barrier films in biological solutions

Abstract The applicability of atomic layer deposited (ALD) metal oxides as protective, encapsulating barriers for bioimplants and wearable technology is tested by determining the corrosion resistance of the films. Al2O3, HfO2, TiO2, and ZrO2 are deposited at 100°C and prove to be cytocompatible thro...

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Autors principals:	Ankit K. Singh, Katarina Adstedt, Tianxin Miao, Julie Champion, Preet M. Singh, Samuel Graham
Format:	Artigo
Idioma:	Inglês
Publicat:	Wiley 2021-03-01
Col·lecció:	Engineering Reports
Matèries:	atomic layer deposition biological solutions stability ultrathin barrier films
Accés en línia:	https://doi.org/10.1002/eng2.12303
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