Cryo-electron tomography reconstructs polymer in liquid film for fab-compatible lithography

Abstract Liquid film is ubiquitous in nature and serves as the critical medium for the dissolution of photoresist to create nanoscale circuit patterns in lithography, which is a core task since the birth of semiconductor industry. However, despite decades of research, the microscopic behaviors of ph...

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Dettagli Bibliografici

Autori principali:	Liming Zheng, Yijie Xia, Xia Jia, Mingyi Gao, Nan Liu, Jiling Song, XiaoPeng Li, Xiaole Zhao, Xin Gao, Wen Zhou, Wenbing Kang, Lijiang Yang, Qianqian Wang, Yiqin Gao, Hong-Wei Wang, Hailin Peng
Natura:	Artigo
Lingua:	Inglês
Pubblicazione:	Nature Portfolio 2025-09-01
Serie:	Nature Communications
Accesso online:	https://doi.org/10.1038/s41467-025-63689-4
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