Broadband Polarization Rotator and Splitter Based on 70 nm-Etched Waveguides on SOI Platform
The standard silicon photonic platforms provide three-step silicon etching, i.e., 220 nm for full etching, 70 nm for shallow etching, and 130 nm (or 150 nm) for slab etching. Previously reported mode-evolution-based polarization rotators and splitters (PSRs) usually employ 130 nm-etched slab wavegui...
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| Κύριοι συγγραφείς: | , , , , , , |
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| Μορφή: | Artigo |
| Γλώσσα: | Inglês |
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MDPI AG
2022-10-01
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| Σειρά: | Photonics |
| Θέματα: | |
| Διαθέσιμο Online: | https://www.mdpi.com/2304-6732/9/10/758 |
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