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Investigations about Al and Cu-Based Planar Spiral Inductors on Sapphire for GaN-Based RF Applications

Conventionally, Cu is preferred over Al to fabricate integrated inductors with higher quality factors on either silicon or sapphire substrates, profiting from its lower resistivity. However, after investigating and comparing these two kinds of metal multilayers in terms of fabrication process, elect...

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Hlavní autoři: Chen Lin, Teng Zhan, Junxi Wang, Jinmin Li, Zhiqiang Liu, Xiaoyan Yi
Médium: Artigo
Jazyk:Inglês
Vydáno: MDPI AG 2021-06-01
Edice:Applied Sciences
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On-line přístup:https://www.mdpi.com/2076-3417/11/11/5164
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