Nanoscale Au-ZnO Heterostructure Developed by Atomic Layer Deposition Towards Amperometric H2O2 Detection

Abstract Nanoscale Au-ZnO heterostructures were fabricated on 4-in. SiO2/Si wafers by the atomic layer deposition (ALD) technique. Developed Au-ZnO heterostructures after post-deposition annealing at 250 °C were tested for amperometric hydrogen peroxide (H2O2) detection. The surface morphology and n...

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Hlavní autoři:	Hongyan Xu, Zihan Wei, Francis Verpoort, Jie Hu, Serge Zhuiykov
Médium:	Artigo
Jazyk:	Inglês
Vydáno:	SpringerOpen 2020-02-01
Edice:	Nanoscale Research Letters
Témata:	Au-ZnO Heterostructures H2O2 Atomic layer deposition Amperometric detection
On-line přístup:	http://link.springer.com/article/10.1186/s11671-020-3273-7
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