Bi₂Te₃ Thin Films Deposited by the Combination of Bi and Te Plasmas in a PLD Process

Bismuth telluride thin films were grown by pulsed laser deposition by implementing a novel method that combines both Te and Bi plasmas resulting from the laser ablation of individual Bi and Te targets. Furthermore, the mean kinetic ion energy and density of the plasmas, as estimated by TOF curves ob...

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Principais autores:	Laura A. Reyes-Verdugo, C. D. Gutiérrez-Lazos, J. Santos-Cruz, A. Chávez-Chávez, J. G. Quiñones-Galván
Formato:	Artigo
Idioma:	Inglês
Publicado:	MDPI AG 2023-02-01
Series:	Micromachines
Assuntos:	thin films pulsed laser deposition plasma parameters bismuth telluride
Acceso en liña:	https://www.mdpi.com/2072-666X/14/3/590
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