High-Temperature Coefficient of Resistance in Mo<sub>x</sub>W<sub>1−x</sub>S<sub>2</sub> Thin Film
Despite the use of transition metal dichalcogenides being widespread in various applications, the knowledge and applications of Mo<sub>x</sub>W<sub>1−x</sub>S<sub>2</sub> compounds are relatively limited. In this study, we deposited a MoW alloy on a Si substrate using a sputter system. Consequently,...
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| Päätekijät: | , , , , |
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| Aineistotyyppi: | Artigo |
| Kieli: | Inglês |
| Julkaistu: |
MDPI AG
2022-05-01
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| Sarja: | Applied Sciences |
| Aiheet: | |
| Linkit: | https://www.mdpi.com/2076-3417/12/10/5110 |
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