The effect of annealing temperatures on the optical parameters of NiO0.99Cu0.01 thin films
NiO0.99Cu0.01 films have been deposited using thermal evaporation technique on glass substrates under vacuum 10-5mbar. The thickness of the films was 220nm. The as -deposited films were annealed to different annealing temperatures (373, 423, and 473) K under vacuum 10-3mbar for 1 h. The structural...
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
University of Baghdad
2019-02-01
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| Col·lecció: | Iraqi Journal of Physics |
| Matèries: | |
| Accés en línia: | https://ijp.uobaghdad.edu.iq/index.php/physics/article/view/223 |
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