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Expanding 3D Nanoprinting Performance by Blurring the Electron Beam

Additive, direct-write manufacturing via a focused electron beam has evolved into a reliable 3D nanoprinting technology in recent years. Aside from low demands on substrate materials and surface morphologies, this technology allows the fabrication of freestanding, 3D architectures with feature sizes...

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Principais autores: Lukas Matthias Seewald, Robert Winkler, Gerald Kothleitner, Harald Plank
Format: Artigo
Sprog:Inglês
Udgivet: MDPI AG 2021-01-01
Serier:Micromachines
Fag:
3D-nanoprinting
additive manufacturing
direct-write manufacturing
metallic nanostructures
helices
nanowires
Online adgang:https://www.mdpi.com/2072-666X/12/2/115
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