Advanced Atomic Layer Deposition Technologies for Micro-LEDs and VCSELs

Abstract In recent years, the process requirements of nano-devices have led to the gradual reduction in the scale of semiconductor devices, and the consequent non-negligible sidewall defects caused by etching. Since plasma-enhanced chemical vapor deposition can no longer provide sufficient step cove...

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Bibliographic Details

Main Authors:	Yen-Wei Yeh, Su-Hui Lin, Tsung-Chi Hsu, Shouqiang Lai, Po-Tsung Lee, Shui-Yang Lien, Dong-Sing Wuu, Guisen Li, Zhong Chen, Tingzhu Wu, Hao-Chung Kuo
Format:	Artigo
Language:	Inglês
Published:	SpringerOpen 2021-11-01
Series:	Nanoscale Research Letters
Subjects:	ALD Micro-LED Passivation VCSEL Reliability
Online Access:	https://doi.org/10.1186/s11671-021-03623-x
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