Morphological continuum and growth-stage design of plasma-grown graphene-based carbon architectures

Plasma-enhanced chemical vapor deposition (PECVD) enables direct growth of graphitic nanostructures with high surface area, open porosity, and good electrical conductivity. Depending on growth conditions, the morphology evolves from isolated ultrathin carbon nanosheets to interconnected wall-like ne...

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Detalhes bibliográficos

Principais autores:	Mineo Hiramatsu, Masaru Hori
Formato:	Artigo
Idioma:	Inglês
Publicado em:	Elsevier 2026-06-01
coleção:	Materials Letters: X
Assuntos:	Plasma CVD Graphene-based carbon Carbon nanowalls Morphological continuum Growth-stage design
Acesso em linha:	http://www.sciencedirect.com/science/article/pii/S2590150826000098
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