Atomistic insights into EUV photoresist photolysis via full temporal dynamics
Abstract One of the challenges in the development of photoresist materials is the trade-off between resolution, line roughness and sensitivity, however, the underlying dynamics remain underexplored. Here, we develop an integrated full temporal framework-combining Fermi’s Golden Rule for photoionizat...
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| Principais autores: | , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Nature Portfolio
2026-04-01
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| coleção: | Communications Chemistry |
| Acesso em linha: | https://doi.org/10.1038/s42004-026-02035-1 |
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