A thermal deformation optimization method for cryogenically cooled silicon crystal monochromators under high heat load
A method to optimize the thermal deformation of an indirectly cryo-cooled silicon crystal monochromator exposed to intense X-rays at a low-emittance diffraction-limited synchrotron radiation source is presented. The thermal-induced slope error of the monochromator crystal has been studied as a funct...
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| Autori principali: | , , , , , |
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| Natura: | Artigo |
| Lingua: | Inglês |
| Pubblicazione: |
International Union of Crystallography
2024-03-01
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| Serie: | Journal of Synchrotron Radiation |
| Soggetti: | |
| Accesso online: | http://scripts.iucr.org/cgi-bin/paper?S1600577523010664 |
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