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Chemical Vapor Deposition Synthesis of Novel Indium Oxide Nanostructures in Strongly Reducing Growth Ambient

The current study reports some interesting growth of novel In2O3 nanostructures using ambient-controlled chemical vapor deposition technique in the presence of a strongly reducing hydrazine ambient. The experiments are systematically carried out by keeping either of the carrier gas flow rate or the...

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Hlavní autoři: Ashish Karn, Nitesh Kumar, Sivanandam Aravindan
Médium: Artigo
Jazyk:Inglês
Vydáno: Nanoscience and Nanotechnology Research Center, University of Kashan 2017-01-01
Edice:Journal of Nanostructures
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On-line přístup:http://jns.kashanu.ac.ir/article_44869_a6781a944de37657f5ef59581efbd7dd.pdf
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